Use of polishing pads

- Jun 13, 2017 -

① The polishing liquid is effectively and evenly transported to different areas of the polishing pad;

② After polishing, the chemical reaction is fully carried out and the reactants and debris are discharged smoothly and the removal effect is achieved.

③ Maintaining the polished liquid film on the surface of the polishing pad so that the chemical reaction is fully carried out;

④ Keep the polishing process smooth, the surface is not deformed, in order to obtain a better wafer surface topography;

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